Production technology of graphene

 An advanced way to manufacture graphene
搜狗截图20200601110054.png     First step: Ni grain growth during annealing in He.

 

     Second step: graphene growth under CVD conditions.

 

     Third step: removal of Ni using adhesive tape.

 

Figure 1: the procedure of the manufacture way

Considerations for this method: 1. prevent cracking of the graphene during the removal of Ni.

                                                          2. prevent bubbles in the graphene when the presure is too high.

9 traditional graphene manufacturing techniques

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(a) Micromechanical cleavage:  using sticky tape to prise apart graphene layers which is widely used in academic research and in industrial environments.

 

 

 

 Figure 2: the mechanism of the micromechanical cleavage

 

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(b) Anodic bonding: a graphite precursor in flake form is bonded to a glass substrate with the help of an electrostatic field and then cleaved off to leave few layer graphene on the substrate.

 

 

 

 Figure 3: the mechanicm of the anodic bonding

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(c) Photoexfoliation:  intact graphene monolayers from a graphite surface. Photoexfoliation should be capable of producing intact graphene monolayers free of contaminants and defects at a high rate.

 

 

 

Figure 4: the mechanism of the photoexfoliation

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(d) Liquid phase exfoliation: this technique is funded either on sonication, or on liquid single-phase high-shear rate flow, as well as hydrodynamic cavitation.

 

 

 

 

 Figure 5: the mechanism of the liquid phase exfoliation

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(e) Growth on SiC: growth of graphene via the thermal decomposition of single-crystal SiC in ultrahigh vacuum (UHV) and under ambient pressure.

 

 

 

 Figure 6: the mechanicm of the growth on SiC

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(f) Precipitation from metal: segregation/precipitation from carbon containing metal substrate.

 

 

 

 

 

 Figure 7: the mechanicm of the precipitation from metal

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(g) Chemical Vapour Deposition: precursor pyrolysis of a material to form carbon, and the formation of the carbon structure of graphene using the disassociated carbon atoms.

 

 

 

 Figure 8: the mechanicm of the chemical Vapour Deposition

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(h) Molecular beam epitaxy: a process in which a thin single crystal layer is deposited on a single crystal substrate using atomic or molecular beams generated in Knudsen cells contained in an ultra-high vacuum chamber.

 

 

 Figure 9: the mechanicm of the molecular beam epitaxy

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(i) Chemical synthesis: using benzene as building block.

 

 

 

 

Figure 10: the mechanicm of the chemical synthesis